TRAVIT EBL software is used to simulate energy deposition and resist development in electron beam lithography.The model takes into account the resist characteristics, exposure parameters, layout, beam blur, diffusion length in the resist, 2D and 3D point spread functions, etc. more
DISPLACE software models charging and displacement of the electron beam due to charging effects on the target's surface. Exposure of the resist layer to a charged beam causes an injection of holes and electrons into the layer. DISPLACE uses advanced physical models to describe the dynamics of surface charging and beam deflection. more
TEMPTATION predicts temperature rises in electron beam lithography. Temperature variations lead to changes in resist sensitivity, and thus to variations in critical dimensions. This problem is especially important in maskmaking, where the substrate is of poor heat conductivity, as well as in direct write EBL, where the writing speed is extremely high. more
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SCATT is a software tool used to simulate light scattering on microelectronic patterns. The software is based on the rigorous coupled wave analysis (RCWA) physical model.The software is equipment-independent and utilizes a user friendly 3D graphical user interface. more
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The Conta software is highly automated. It does not need any parameters to be set by user. Neither it requires a design file of a pattern. The software is based on high level mathematics, not on AI. Therefore, no training is needed and there are no issues and uncertainties associated with the AI. Input for the software is a directory of SEM images to be processed. Output are contours from these images in txt format as well as images with outlined contours. more